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In ProgressPhysical Fabrication

Neural Probe Prototype

Project Overview

I worked in a collaborative and cross-functional team to design and fabricate neural probes tailored for electrochemical serotonin detection. By leveraging SU-8 photoresist as a structural substrate and UV-lithography for patterning, we are developing a biocompatible, robust tool capable of monitoring neurotransmitter dynamics with high spatial resolution.

The Challenge

Serotonin plays a critical role in mood, cognition, and neurological disorders, yet monitoring it in real-time remains a challenge. Traditional metal electrodes are often too rigid, leading to tissue scarring, while existing flexible probes can lack the structural integrity needed for deep-brain insertion. The goal was to bridge that gap: creating a probe that is mechanically stable yet biocompatible for long-term sensing.

The Solution: Why SU-8?

We chose SU-8 (an epoxy-based negative photoresist) for its unique properties:

  • Mechanical Strength: High Young’s modulus allows for thin, needle-like geometries that can penetrate tissue without buckling.
  • Chemical Inertness: Ensures the probe remains stable in the corrosive biological environment.
  • Process Versatility: Enables the integration of multi-layer metal traces (Gold/Platinum) for the sensing electrodes.

Microfabrication Pipeline

The fabrication was carried out in a Class 100/1000 cleanroom environment, utilizing a multi-mask lithographic process:

  1. Substrate Preparation: Silicon wafer cleaning and dehydration bake.
  2. Base Layer: Spin-coating and curing the initial SU-8 structural layer.
  3. Metallization: Sputter deposition and lift-off patterning of 8 Platinum (Pt) micro-electrodes.
  4. Insulation & Passivation: Application of a top SU-8 encapsulation layer, leaving only the sensing “hotspots” and bond pads exposed.
  5. Release: Final development and sacrificial layer etching to release the individual flexible probes.

Key Technical Specs: The resulting probes featured a shank width of <200μm, minimizing displacement during neural insertion. It also used edge electrodes rather than center electrodes to enhance selectivity and reduce the impact of gial scaring from insertion.

Skills & Tools

  • Design: CAD (Klayout) for mask design.
  • Lithography: Mask aligners, UV exposure, and photoresist chemistry (SU-8 3000 series).
  • Metrology: SEM (Scanning Electron Microscopy) for topography

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